氮掺杂氟化非晶碳薄膜光学性质的研究  

Optical Properties of Nitrogen Doping Fluorinated Amorphous Carbon Thin Films

作　　者：刘雄飞[1] 周昕[1] 

机构地区：[1]中南大学物理科学与技术学院,湖南长沙410083

出　　处：《材料科学与工程学报》2006年第4期531-534,共4页Journal of Materials Science and Engineering

摘　　要：用射频等离子体增强化学气相沉积(RF-PECVD)法制备氮掺杂氟化非晶碳(a-C:F:N)薄膜。用紫外-可见分光光谱仪、椭偏仪、傅立叶变换红外光谱仪对薄膜进行了检测。结果表明:随源气体中氮气含量的增加,光学带隙先减小后升高,折射率变化情况与之相反。在其它条件相同的情况下,升高沉积温度使得薄膜的光学带隙和折射率降低。光学带隙的大小与sp2键含量密切相关,sp2键浓度越大,薄膜的光学带隙越小。Nitrogen doping fluorinated amorphous carbon （a-C： F： N） thin films were prepared by RF-PECVD. The films were investigated by FTIR, UV-VIS and ellipsometer. The results show that the optical band gap first decreased and then increased with the increasing of N2 gas source. The refractive index changed in reverse order. With the increasing of.temperature, the optical band gap and the refractive index reduced. It demonstrated that there was a close relation between the optical band gap and sp^2 bond structure. The optical band gap decreased with the sp^2 bond structure increasing.

关 键 词：氮掺杂 氟化非晶碳薄膜 光学带隙 

分 类 号：O484.41[理学—固体物理]