化学气相沉积对Pt/KL沸石芳构化性能的影响  

Effect of Chemical Vapour Deposition on Pt/KL Catalyst for the Aromatization of n-Hexane

作　　者：郑坚[1] 淳远[1] 董家禄[1] 须沁华[1] 

机构地区：[1]南京大学化学化工学院,南京210093

出　　处：《物理化学学报》1996年第10期939-942,共4页Acta Physico-Chimica Sinica

摘　　要：Modification of KL zeolite by chemical vapour deposition (CVD) of Si(OEt)4 and (CH3)3SiOSi(CH3)3 was used to study the influence of zeoltie support on the aromatization of n-hexane over Pt/KL catalyst. The pore size and pore volume of zeolite were decreased by CVD. The acidic hydroxyl groups remaining on the surface of KL zeolite were removed and thus the selectivity of non-acidic catalyzed aromatization reaction was improved. Whereas the activity of aromatiztion reaction was decreased due to the destruction of some of active sites in KL zeolite for 1,6-cyclization. Becuase of the coverage of the framework of zeolite by CVD of SiO2, Pt particles became more electron-excess.Therefore, the silica-coated catalysts were easier to be poisoned by sulphur.Modification of KL zeolite by chemical vapour deposition (CVD) of Si(OEt)4 and (CH3)3SiOSi(CH3)3 was used to study the influence of zeoltie support on the aromatization of n-hexane over Pt/KL catalyst. The pore size and pore volume of zeolite were decreased by CVD. The acidic hydroxyl groups remaining on the surface of KL zeolite were removed and thus the selectivity of non-acidic catalyzed aromatization reaction was improved. Whereas the activity of aromatiztion reaction was decreased due to the destruction of some of active sites in KL zeolite for 1,6-cyclization. Becuase of the coverage of the framework of zeolite by CVD of SiO2, Pt particles became more electron-excess.Therefore, the silica-coated catalysts were easier to be poisoned by sulphur.

关 键 词：化学气相沉积 沸石 催化剂 正己烷 芳构化 铂 

分 类 号：O623.11[理学—有机化学]