辅助气体CH_4和Ar对IBED制备碳膜性能的影响  

Effect of Assisted Gases(CH_4,Ar)on Carbon Coatings Formed by Ion Beam Enhanced Deposition

作　　者：李璞[1] 关凯书[1] 朱晓东[2] 周建新[1] 

机构地区：[1]华东理工大学化工机械研究所,上海200237 [2]西安交通大学材料学院,陕西西安710049

出　　处：《表面技术》2006年第4期24-26,共3页Surface Technology

摘　　要：采用离子束辅助沉积技术(IBED)制备了一系列碳膜,重点分析辅助气体CH4、Ar对碳膜组成相、电阻率、厚度和硬度的影响。结果表明:采用CH4辅助轰击制得的薄膜厚度高于采用Ar辅助轰击的薄膜厚度;采用Ar辅助轰击的薄膜在硬度、结合强度方面要优于CH4辅助轰击的薄膜;相对于类金钢石薄膜,所制备的碳膜更接近于类石墨膜。An emphasis analysis is conducted for the effect of assisted gases （ CH4, Ar） on carbon coatings, which were prepared by ion beam enhanced deposition （IBED） system. The effects of assisted gases on structures and properties of the coatings are investigated. The experiment results show that as CH4 introduced, the thickness of carbon coatings is better than as Ar introduced. As Ar introduced, the hardness and bond strength of coatings are better than the coatings as CH4 introduced. Compare with DLC, carbon coatings formed by ion beam enhanced deposition are very similar to GLC.

关 键 词：离子束辅助 增强沉积 碳膜 类石墨膜 结合强度 

分 类 号：TG174.444[金属学及工艺—金属表面处理] O484[金属学及工艺—金属学]