低温熔盐中Yb-Ni合金膜的电沉积研究  

Electrodeposition of Yb-Ni Alloy Film in Low Temperature Molten Salt

作　　者：陈必清[1] 王建朝[1] 刘青[1] 王金贵[1] 郭承育[1] 

机构地区：[1]青海师范大学化学系,西宁810008

出　　处：《武汉理工大学学报》2006年第8期5-8,共4页Journal of Wuhan University of Technology

基　　金：国家自然科学基金(50264004)

摘　　要：在Pt、Cu电极上,于353 K的乙酰胺-尿素-NaBr熔体中,Ni(Ⅱ)+2e→Ni(0)是一步完全不可逆反应,实验测得NiCl2(0.060 mol/dm3)-乙酰胺-尿素-NaBr熔体中,Ni(Ⅱ)在Pt上,传递系数α=0.27,扩散系数D0=6.51×10-5cm2/s,Cu上α=0.26,D0=6.02×10-7cm2/s。Yb(Ⅲ)不能单独还原为Yb(0),但可以被Ni(Ⅱ)诱导共沉积。XRD表明,由恒电位电解法得到非晶态的Yb-Ni合金,Yb的含量随阴极电位、Yb(Ⅲ)/Ni(Ⅱ)物质的量比及电解时间的变化而变化。Electroreduction of Ni^2＋ to Ni in acetamide-urea-NaBr melt on Pt and Cu electrode at 353 K was irreversible in one step. At Pt and Cu eletrode the diffusion coefficient and electron transfer coefficient of Ni^2＋ in 0. 060 mol/dm^3 NiCl2-acetamide-urea-NaBr melt were determined. The transfer coefficient a = 0.27 and diffusion coefficient Do = 6.51× 10^- 5 cm^2·s^- 1 of the Pt eletrode and transfer coefficient a = 0.26 and diffusion coefficient Do = 6.02 × 10^-7 cm^2·s^- 1 of the Cu eletrode were measured. Yb^3＋ was not reduced to Yb alone , but could be inductively co deposited with Ni^2＋ . The amorphous Yb-Ni alloy films were obtained by potentiostatic electrolysis. The content of Yb in the Yb-Ni deposits changed with the cathode potential , molar ratio of Gd^3 ＋ / Ni^2 ＋ and the electrolysis time.

关 键 词：稀土 乙酰胺-尿素-NABR熔体 扩散系数 诱导共沉积 Yb—Ni合金膜 

分 类 号：O641.4[理学—物理化学]