掺杂Ti对Fe－N薄膜结构与磁性的影响  

EFFECTS OF Ti DOPING ON THE STRUCTURE AND MAGNETIC PROPERTY OF Fe-N FILMS

作　　者：王合英[1] 姜恩永[1] 白海力[1] 吴萍[1] 刘明升[1] 

机构地区：[1]天津大学,天津大学应用物理系

出　　处：《金属学报》1996年第11期1199-1203,共5页Acta Metallurgica Sinica

基　　金：国家自然科学基金;中关村联合测试基金;天津市21世纪青年科学基金

摘　　要：用对向靶溅射仪制备出含多量Ｆｅ（１６）Ｎ２相的（Ｆｅ，Ｔｉ）－Ｎ薄膜，研究了掺杂Ｔｉ对Ｆｅ－Ｎ薄膜结构与磁性的影响，在溅射Ｆｅ－Ｎ薄膜时加入适量的Ｔｉ可提高Ｆｅ－Ｎ薄膜中Ｆｅ（１６）Ｎ２相的含量．Ｔｉ含量（原子分数）在０—２５％时薄膜饱和磁化强度均高于纯Ｆｅ的值；Ｔｉ浓度为１０％时，薄膜磁化强度高达２．６８Ｔ，比纯Ｆｅ的饱和磁化强度值高２０％．Fe,Ti)-N films with high content of Fe16N2 phase are prepared by facing target sputtering. Influences of doped titanium content on the structure and magnetic properties of Fe-N films are investigated. According to XRD and TEM results, optimum Ti additions enhance the formation of the 16:2 nitride, the values of saturation magnetization Bs for (Fe,Ti)-N films with Ti atomic fraction of 0 25% are larger than that for pure bcc iron, the maximum value for Bs is 2.68 T for the sample with 10% Ti, this value is 20% larger than that for pure bcc iron.

关 键 词：对向靶溅射 掺杂 磁性 薄膜 钛 

分 类 号：O484[理学—固体物理]