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作 者:汤文杰[1] 张跃飞[1] 陈强[1] 葛袁静[1]
机构地区:[1]北京印刷学院,北京102600
出 处:《包装工程》2006年第5期31-33,共3页Packaging Engineering
摘 要:大气下,采用DBD等离子体枪为等离子体聚合装置,以甲烷为单体,氩气为工作气体,在载玻片和单晶硅片上沉积类金刚石薄膜(DLC)。考察了基片预处理、内电极形状、进气方式、以及等离子体炬喷口和基材的距离对DLC薄膜沉积的影响。通过傅立叶变换红外光谱(FTIR)分析聚合膜结构并探索可能的沉积机理;表面轮廓仪测定了成膜速率;并对薄膜进行了机械性能测量。Diamond- Like Carbon (DLC) films were deposited by a DBD plasma gun at an atmospheric pressure, with CH4 as a precursor and Ar as dilution gas. The effects of DLC film properties from such as the shape of the electrode ,site of CH4 injection, the pretreatment of the substrate and the distance between nozzle and substrate were carried out during DLC film deposition. FTIR were employed to characterize the DLC films and the profilmeter was used to measure the deposition rate. The friction characteristic was also measured.
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