有序介孔二氧化硅薄膜制备及其组装化学  

Preparation of Ordered Mesoporous Silica Thin Films and Their Assembly Chemistry

作　　者：张学骜[1] 刘长利[1] 钱斯文[1] 吴晓森[1] 王建方[1] 吴文健[1] 

机构地区：[1]国防科技大学航天与材料工程学院,长沙410073

出　　处：《化学进展》2006年第10期1322-1329,共8页Progress in Chemistry

基　　金：国家高技术发展计划(863)项目资助(No.2003AA005017)

摘　　要：本文综述了近年来利用有机模板法合成有序介孔二氧化硅薄膜的研究进展,重点阐述了两相界面外延生长和蒸发诱导自组装两种制备方法及其合成机理。此外,讨论了有序介孔二氧化硅薄膜的组装化学,包括金属元素掺杂,纳米粒子在介孔薄膜中的组装,以及有机物/二氧化硅纳米复合薄膜的制备,并对介孔二氧化硅薄膜未来的发展趋势做了展望。Advances in the organic-templating synthesis of ordered mesoporous silica thin films are reviewed. The synthetic mechanism and preparation methods, such as extension growth of two interface and evaporation-induced selfassembly, are emphatically discussed. Furthermore, assembly chemistry of ordered mesoporous silica thin films are introduced, including metallic element doped mesoporous thin films, assembly of nanometer particles in mesoporous thin films, and preparation of organic/silica nanocomposite thin films. The developing trends in ordered mesoporous silica thin films are also proposed.

关 键 词：有序介孔 二氧化硅薄膜 制备 组装化学 

分 类 号：O613.72[理学—无机化学] TB383[理学—化学]