粗糙表面的可控润湿性研究  

Study on Controllable Wettability of Roughness Surfaces

作　　者：朱亮[1] 冯焱颖[1] 叶雄英[1] 武雁斌[1] 周兆英[1] 

机构地区：[1]清华大学精密仪器与机械学系

出　　处：《传感技术学报》2006年第05A期1709-1712,共4页Chinese Journal of Sensors and Actuators

基　　金：国家自然科学基金资助(50405001);传感技术联合国家重点实验室基金资助(skt0502);清华大学博士生科研创新基金资助

摘　　要：本文利用微机械加工技术,通过改变材料表面微观几何结构,研究材料表面微结构对于表观润湿性的影响规律.我们在以前工作的基础上,分别研究了不同设计尺寸的表面微柱阵列结构的亲水表面的表观接触角的变化,研究结果表明,通过改变材料表面的微结构,在亲水的本征表面上,粗糙表面的表观接触角更加符合Wenzel的理论预测.文章也通过在微柱表面利用化学腐蚀方法制作多孔硅结构的方法,形成了具有阶层结构的粗糙表面.具有多孔硅结构和微柱阵列的疏水表面(OTS)上,测得最大接触角是157.18o.We studied the the effect of topographical surface patterns on wettability of a solid surface by changing its roughness using MEMS fabrication and self-assembled monolayer modification. Based on our previously work, the apparent CAs on different designed micro square-pillar arrays of hydrophilic surfaces were observed and analyzed, and the experimental results were closer to Wenzel＇s theoretical predictions on the super-hydrophilic surfaces than that by Cassie＇s theory. We also fabricated hierarchical rough surfaces by making porous silicon through chemical etching on the surfaces of micropillar array. The largest apparent CA on the porous silicon with micropillar array was up to 157. 18°.

关 键 词：超疏水表面 粗糙度 润湿性 微机械加工 多孔硅 

分 类 号：TN4[电子电信—微电子学与固体电子学] TG84[金属学及工艺—公差测量技术]