薄膜系列实验的教学研究  

Research on the thin film series experiment

作　　者：熊永红[1] 许巍[1] 麦远棠[1] 孙超伦[1] 林楠[1] 

机构地区：[1]华中科技大学物理系,湖北武汉430074

出　　处：《物理实验》2006年第10期9-13,共5页Physics Experimentation

摘　　要：从薄膜制备、生长过程动态分析以及形貌表征3方面设计了薄膜系列实验.用离子束溅射制备金属薄膜,研究了制备条件对溅射速率的影响,测量了薄膜生长过程中电阻的变化,用扫描隧道显微镜或原子力显微镜观测薄膜的表面形貌,并分析不同制备条件得到的薄膜的表面形貌特征.We have an exploratory research on three aspects of the thin film experiment, including the preparation, dynamic analysis on its growth, and the characterization of the surface. Ion beam sputtering method is applied to prepare the thin film. The influence of different preparing conditions on the deposition speed is studied, the resistance of the film is measured during its growth. Scanning tunneling microscope （STM） or atomic force microscope （AFM） is used to observe the surface of the thin film. Different characteristics of the surfaces in different preparing conditions are analyzed. This experiment contains comprehensive knowledge on vacuum, ion beam sputtering, in situ dynamic measurement of resistance, STM and so force.

关 键 词：薄膜 离子束溅射 原位动态电阻测量 扫描隧道显微镜 

分 类 号：O484[理学—固体物理]