掺硼多晶金刚石膜的电化学性能研究  

Electrochemical Properties of Boron-doped Polycrystalline Diamond Films

作　　者：李春燕[1] 潘凯[2] 吕宪义[1] 李明吉[1] 刘兆阅[2] 白玉白[2] 李博[1] 金曾孙[1] 

机构地区：[1]吉林大学超硬材料国家重点实验室,长春130023 [2]吉林大学化学学院,长春130023

出　　处：《高等学校化学学报》2006年第11期2136-2139,共4页Chemical Journal of Chinese Universities

基　　金：国家'八六三'计划(批准号:2002AA325090)资助

摘　　要：采用EACVD(E lectron Assisted Chem ical Vapor Deposition)方法制备了掺硼金刚石膜,并用扫描电镜、拉曼光谱及霍尔效应等测试方法对其表面形貌、生长特性、载流子浓度以及导电性能进行了分析.测试结果表明,掺硼金刚石膜是由微米级晶粒组成的多晶膜,其载流子浓度为4.88×1020cm-3,电阻率为0.03Ω.cm,是高品质金刚石膜.用该金刚石膜制作电化学电极,利用循环伏安法分别测量了金刚石膜电极在氯化钾空白底液、亚铁氰化钾溶液和左旋半胱氨酸溶液中的循环伏安曲线,发现该金刚石膜电极在水溶液中具有宽的电化学窗口(约为3.7 V)和接近零的背景电流,在生物制剂的检测中具有很高的灵敏度和良好的稳定性,是一种理想的电化学电极材料.Boron-doped diamond films were deposited by EACVD（ Electron Assisted Chemical Vapor Deposition） method in this paper. SEM, Raman spectroscopy and Hall effect measurements were employed to analyze the morphology, the growth mechanism, the carrier concentration and the electrical conductivity of the samples. The results show that the samples are high-quality polycrystalline diamond films composed of micrometer-sized grains. The carrier concentration and the resistivity of the samples are 4.88 × 10^20 cm^-3 and 0. 03Ω·cm, respectively. These diamond films were used as the electrochemical electrodes, and cyclic voltammetry was used to measure the current-voltage curves of the diamond electrodes in KCl solution, K4Fe（CN）6 solution, and CySH solution, respectively. The results show that these diamond film electrodes have a wide electrochemical window of about 3.7 V and a low background current close to zero in the aqua solution, and they have a high sensitivity and good stability in the biopreparates detection experiment, which makes boron-doped diamond film being an excellent material of electrochemical electrode.

关 键 词：掺硼金刚石膜 电化学电极 循环伏安法 生物制剂检测 

分 类 号：O646[理学—物理化学] O613.71[理学—化学]