红外增透与保护膜技术的研究  

Study of Infrared AR and Protecting Coating Technology

作　　者：付秀华[1] 董连和[1] 付新华[1] 王崇娥[1] 

机构地区：[1]长春理工大学光电工程学院,吉林长春130022

出　　处：《激光与红外》2006年第12期1162-1164,共3页Laser & Infrared

摘　　要：采用电子束与离子辅助沉积技术，在氟化镁晶体材料上制备3．5～4．9μm增透与保护膜。经过实验，选取氧化钛与二氧化硅作为薄膜材料，并优化沉积工艺参数，尽可能减少吸收损失，对氟化镁基底实现有效的增透和保护。实验结果表明，镀膜后其单面剩余反射率由未镀膜时的2．5％减少到1．2％，并能承受湿热和雨淋测试。Using electron beams and ion assisted deposition techniques, on the substrates of magnesium fluoride crystal materials prepared the anti-reflection coating and the protecting coating in 3.5-5. 9μm. Titanium oxide and silicon dioxide were used as thinfilm materials and deposition parameters were optimized to minimize the absorption loss, so there could be effective reflection reducing and protection for fluorinated magnesium substrates. The experimental resuits show that after coating the single residual reflectance was reduced from 2.5% to 1.2% and could withstand the muggy and rain testing.

关 键 词：红外增透膜 保护膜 离子辅助沉积 吸收损失 剩余反射率 

分 类 号：TN213[电子电信—物理电子学]