离子束溅射La_(0.5)Sr_(0.5)CoO_(3-δ)薄膜的XRD和XPS研究  

XRD and XPS Study of La_(0.5)Sr_(0.5)CoO_(3-δ) Film Grown by Ion-Beam Sputtering

作　　者：朱志强[1] 丁铁柱[1] 张利文[1] 王强[1] 赵倩[1] 

机构地区：[1]内蒙古大学理工学院物理系,呼和浩特010021

出　　处：《真空科学与技术学报》2006年第6期494-499,共6页Chinese Journal of Vacuum Science and Technology

基　　金：国家自然科学基金项目(No.10464001);内蒙古大学513人才计划项目

摘　　要：采用离子束溅射法在氧化钇稳定的氧化锆(YSZ)和铝酸镧(LaAlO3)上溅射RE0.5Sr0.5CoO3-δ薄膜,测试了薄膜的XRD、XPS谱、分析了表面微结构及化学状态。实验表明,随着热处理温度的升高,La0.5Sr0.5CoO3-δ薄膜在YSZ和LaAlO3上生长时有取向增强的趋势,并且晶粒度增大,晶格氧减少,氧空位增加,氧输运性能提高。当热处理温度为750℃时薄膜结晶度最好,晶粒度最大,氧输运性能最好。La0.5Sr0.5CoO3-δ fims were grown by ion-beam sputtering, on substrates of yttrium-oxide-passivated zirconium oxide（YSZ） and aluminate lanthanum（LaAlO3 ）, respectively. Its microstructures and its stoichiometries were characterized with X-ray diffraction（XRD） and X-ray photoelectron spectroscopy（XPS）. The results show that the annealing temperature signficanfly affects the film microstructures. For instance,the higher the annealing temperature,the more pronounced the preferential growth orientation and the bigger the grain. Moreover, the oxygen mobility increases, resulting in an increase of density of oxygen vacancy. The optimal annealing temperature was found to be 750℃, at which high quality films were grown with large-sized crystal grains and highest oxygen transport.

关 键 词：离子束溅射 La0.5Sr0.5CoO3-δ薄膜 XRD谱 XPS谱 

分 类 号：O484[理学—固体物理]