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机构地区:[1]西安电子科技大学理学院
出 处:《红外与激光工程》2006年第6期777-779,共3页Infrared and Laser Engineering
基 金:国家自然科学基金项目(60371020)
摘 要:采用端部霍尔离子源在硅基底上制备了含氢非晶碳膜(a-C:H),并测量了4 000~1 500 cm-1的红外透射光谱。基于单层薄膜的透射关系,获得了仅有六个拟合参数的光学常数计算模型。利用该模型,可以同时获得薄膜在宽波段范围内的光学常数和厚度:折射率的最大值为1.94,消光系数的最大值为0.014 9,拟合薄膜厚度为617 nm。Hydrogenated amorphous carbon thin films were deposited on silicon substrates using endhall plasma ion source. The optical properties of amorphous carbon thin films were investigated in the wavelength range of 4 000-1 500 cm^-1. Meanwhile, based on the transmittance relations of single layer film on the transparent substrate, the computation model with six fitting parameters was developed to calculate the optical constants. The optical constants of thin films in the wide wavelength range and the film thickness were obtained by the model simultaneously. The maximum values of the refractive index and extinction coefficient are 1.94 and 0.014 9, respectively. The film thickness by the fitting is 617 nm.
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