数字掩模技术  

Digital Mask Technology

作　　者：陈劲松[1] 

机构地区：[1]安徽财经大学信息工程学院,安徽蚌埠233041

出　　处：《液晶与显示》2006年第6期700-703,共4页Chinese Journal of Liquid Crystals and Displays

基　　金：安徽省教育厅自然科学基金项目(No.2006KJ050B)

摘　　要：数字掩模技术的核心器件是数字微镜芯片,它具有较高的分辨率和灰度等级等优点。利用计算机辅助设计绘制的掩模图形经IO口输入到数字微镜芯片中的SRAM,从而控制无数多个微小镜片的翻转,实现掩模图形的数字化输出。结合高倍精缩投影系统,可快速实现图形转印。为进一步说明该技术的可行性,进行了实验验证。由于实验条件的限制,文中仅实现了2.2μm最小线宽的制作。利用该技术成功制作了5×5达曼光栅、8台阶闪耀光栅和菲涅尔透镜。DMD chip is the core device of digital mask technology, and it has such advantages as high resolve, gray level, and so on. The mask graphics made by CAD is input to SRAM on the DMD chip from computer IO port, which controls overturn of innumerable minute mirrors. So the digital output of mask graphics is realized. If combined with high multiple reduced projection system, this technology can realize transfer of mask graphics fleetly. In order to show the feasibility of this technology, The experimental test is carried out. Due to the limited experimental condition, the manufacture of only 2.2 μm minimal line width is realized. Using digital mask technology, 5×5 Dammann grating, eight levels blazed grating, and eight levels Fresnel lens are made successfully.

关 键 词：数字微镜 数字掩模 衍射光学元件 空间光调制器 

分 类 号：TN15[电子电信—物理电子学] TN305.7