电子束蒸发Ar离子辅助沉积Si光学薄膜的特性  

Optical Characteristics of Si Films by Ar Assisted Electron Beam Evaporation Deposition

作　　者：舒雄文[1] 徐晨[2] 田增霞[2] 沈光地[2] 

机构地区：[1]中国科学院理化技术研究所,北京100080 [2]北京工业大学光电子技术实验室,北京100022

出　　处：《半导体光电》2006年第6期740-741,787,共3页Semiconductor Optoelectronics

基　　金：国家"973"计划资助项目(G200068302);北京市教委基金资助项目(KM200310005009);北京市科委基金资助项目(D0404003040221)

摘　　要：对用常规电子束蒸发和Ar离子辅助沉积所得的非晶硅光学薄膜的光学常数、表面形貌、热稳定性和湿度稳定性等进行了研究。结果发现Ar离子辅助沉积所得非晶硅光学薄膜的折射率大大提高,表面粗糙度明显降低,湿度稳定性和热稳定性也得到较大改善,但是光学带隙变窄,光学吸收增加。The optical constants, surface structure, thermal and humidity stability of amorphous silicon optical films have been investigated by using regular electron beam evaporation and Ar assisted deposition. It is found that Ar ion bombardment can enhance the refractive index, decrease the roughness and improve the thermal and humidity stability, and but it leads to the narrowing of the bandgap and the increase of the optical absorption.

关 键 词：光学薄膜 离子辅助沉积 光学常数 热稳定性 湿度稳定性 

分 类 号：TN305.8[电子电信—物理电子学]