超精密抛光中合适参量抛光粉的选择  

Selection of Appropriate Parameters' Polishing Powder for Ultra Precise Polishing

作　　者：韩敬华[1] 杨李茗[2] 冯国英[1] 刘民才[2] 高胥华[2] 刘夏来[1] 杨浩[1] 

机构地区：[1]四川大学 [2]成都精密光学工程研究中心

出　　处：《工具技术》2007年第1期69-71,共3页Tool Engineering

基　　金：国家863计划资助项目

摘　　要：在超精密抛光加工过程中,抛光粉参量对抛光质量的影响很大。试验研究抛光粉主要参量随抛光时间的变化规律,得到了适合超精密抛光的抛光粉参量的主要特点。根据抛光原理分析了抛光粉的主要参量对抛光表面的作用机理,提出一种选择适于抛光的合适参量抛光粉的方法。结果表明,利用该方法选择的抛光粉可稳定地加工出高质量的超光滑表面。During the process of ultra precise polishing, the polishing quality is affected greatly by the parameters of polishing powder. The law of the parameters of the polishing powder versus the polishing time is studied and the major features of polishing powder＇ s parameters for the ultra precise polishing is obtained through experiments. The action mechanism of polishing powder＇ s main parameters on polishing surface is analyzed based on the polishing principle, and the method to select the appropriate parameters＇ polishing powder for the ultra precise polishing is proposed. The experimental results indicate that the ultra smooth surface can be preduced stably by using the polishing power chosen in this way.

关 键 词：光学材料 抛光 超光滑表面 粒度分布 表面疵病 

分 类 号：TG580.692[金属学及工艺—金属切削加工及机床]