碳化硅轻型反射镜的研究进展  

Development of Lightweight Silicon Carbide Mirror

作　　者：邓清[1] 肖鹏[1] 熊翔[1] 

机构地区：[1]中南大学粉末冶金国家重点实验室,长沙410083

出　　处：《材料导报》2007年第2期5-9,共5页Materials Reports

基　　金：新世纪优秀人才支持计划(NCET-05-0694)

摘　　要：反射镜材料需具有低密度、高弹性模量、高热导率和低热膨胀系数。比较了不同反射镜材料的物理性能和机械性能,与传统光学材料对比,碳化硅具有优越的物理性能和热性能,被认为是轻型反射镜材料的首选。综述了碳化硅反射镜材料常用制备方法的特点。认为反应烧结法和热等静压法适用于制备SiC反射镜基体材料,化学气相沉积法适合用于基体材料增密和制备反射层,反应烧结法结合化学气相沉积工艺是制备SiC反射镜的高效低成本工艺。Some of the preferred characteristics for an optical mirror material include low density, high elastic modulus, low coefficient of thermal expansion, and high thermal conductivity. In this paper, the physical and mechanical properties of different materials of optical mirror are compared. Silicon carbide（SiC） has long been recognized as an attractive mirror material due to its superior mechanical and thermal properties when compared to conventional optical materials. The fabrication process and application of silicon carbide mirror are presented. Reaction sintering process and hot isostatic pressing（HIP） are considered to be the suitable way for preparing SiC mirror substrate materials, and chemical vapor deposition（CVD） is suitable to be used in densification of substrate material and preparing SiC coating. Reaction sintering process combined with CVD is an effective and low cost process of preparing SiC mirror materials.

关 键 词：反射镜 碳化硅 研究进展 

分 类 号：TB332[一般工业技术—材料科学与工程]