SmCo薄膜的共溅射制备及磁学性能研究  

Studies on the Preparation and the Magnetic Property of SmCo/Cr Thin Films with Co-sputtering

作　　者：王辉[1] 黄致新[1] 吴斌[1] 张峰[1] 刘敏[1] 张玉龙 章平 

机构地区：[1]华中师范大学物理科学与技术学院,武汉430079 [2]郧阳高等师范专科学校物理与电子工程系,丹江口442700

出　　处：《信息记录材料》2007年第1期47-50,共4页Information Recording Materials

基　　金：湖北省自然科学基金资助项目;(2005ABA041)

摘　　要：采用磁控共溅射方法制备了非晶态的SmCo磁性薄膜,用振动样品磁强计(VSM)分析了薄膜的磁学性能,并通过原位后退火处理研究了其磁学性能。结果表明,在600℃下退火30分钟,SmCo薄膜样品的矫顽力升高,并且磁化取向有从面内转向垂直方向的趋势。Amorphous SmCo magnetic films were fabricated by magnetron co-sputtering method and the magnetic properties were measured by a vibrating sample magnetometer （VSM）. Through in-site post annealing, the magnetic properties of the SmCo thin films were investigated. The results shows that after 600℃, 30rain annealing, the coercivity of SmCo films will be increased and the magnetic anisotropy will be changed from in-plane to normal-plane.

关 键 词：SmCo薄膜 共溅射 退火 矫顽力 

分 类 号：O482.5[理学—固体物理]