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作 者:王雪峰[1] 许颜正[1] 余敏[1] 郑企克[1]
出 处:《化学学报》1996年第12期1186-1193,共8页Acta Chimica Sinica
基 金:国家自然科学基金资助的项目
摘 要:本文研究了在低温固体Ar中NO和O_2的反应采用Ar作基质,将NO和O_2分层沉积或混合沉积在低温基板上,通过逐渐升温来控制扩散速率,在温度10K~35K范围内,从样品付里叶变换红外光谱的变化,首次观察了NO和O_2反应中间体的生成和转化,由此给出了反应机理,即NO在Ar基质中首先发生扩散和聚合,生成cis-(NO)_2,随后与氧反应生成asym-N_2O_3和iso-N_2O_4,而asym-N_2O_3进一步氧化生成N_2O_4(D_(2h))The reaction of NO and oxygen in gas phase has been studied intensively, but theintermediates still remain unclear. This paper presents a method to see the intermediates of thereaction of oxygenand NO isolated in Ar via softening the rigid matrix and making reactantmolecules diffuse slowly and collide for the first time. The reaction products are probed with a Fourier Transform Infrared Spectrometer. Results show that below 20K, only dimerization takes place. When the temperature reaches 30K, the absorption of iso - N2O4 and asyrn - N2O3 appear and that of dimers decreases. When the temperature is raised above 35K, N2O4(D2h) and asyrn - N2O3 are formed. The reaction mechanism process is proposed:NO + NO→cis-(NO)2cis-(NO)2+ O2→iso-N2O42 cis - (NO)2 + O2→2 asym - N2O32 asym-N2O3 + O2→2 N2O4(D2h)
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