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作 者:王劲[1] 唐屹[1] 曾晓丹[1] 王剑[1] 谢美丽[1]
机构地区:[1]高分子材料工程国家重点实验室四川大学高分子科学与工程学院,四川成都610065
出 处:《电子元件与材料》2007年第2期34-36,共3页Electronic Components And Materials
基 金:国家"863"子课题资助项目(2001AA334020-1)
摘 要:以脂肪族二胺、芳香杂环二胺和芳香四羧酸二酐或芳香四羧酸二酐、芳香族二胺为原料,N-甲基吡咯烷酮为溶剂,合成两种聚酰胺酸。逐层涂覆,制备了表面为热可塑聚酰亚胺的三层聚酰亚胺复合膜,与铜箔热压复合制备了双面覆铜挠性印制电路基板。热塑性聚酰亚胺胶的玻璃化转变温度为133℃,三层聚酰亚胺复合膜的结晶熔融温度为222℃。该挠性印制电路基材平均剥离强度为7.1 N/cm。Two kinds of polyamic acids (PAA) were prepared by aliphatic diamine, aromatic diamine and aromatic dianhydride in NMP (N-methyl pyrrolidone). The PAA solution was cast one by one and thermal-imidized. On the basis of this procedure, three-layer polyimide films were prepared with thermoplastic polyimide on the surface layer. Double-sided FCCL (flexible copper clad laminates) was prepared by hot-pressing with copper foils. The results shown for thermoplastic polyimide film, the glass transition temperature is 133 ℃, the crystal melt temperature of threelayer polyimide film is 1222℃. The mean peel strength of FCCL between polyimide films and copper foils is 7.1 N/cm.
关 键 词:电子技术 挠性印制电路(HPC) 热可塑聚酰亚胺 结晶
分 类 号:TN604[电子电信—电路与系统]
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