H^+辐照前后Mo涂层表面的XPS分析  

XPS characterization of the molybdenum films before and after H+ ion irradiation

作　　者：刘春海[1] 杜晓松[2] 汪德志[1] 黄宁康[1] 杨斌[1] 

机构地区：[1]四川大学原子核科学技术研究所教育部辐射物理及技术重点实验室,四川成都610064 [2]电子科技大学光电信息学院,四川成都610054

出　　处：《功能材料》2007年第2期176-178,182,共4页Journal of Functional Materials

基　　金：国家自然科学基金资助项目(59781002);辐射物理及技术教育部重点实验室基金资助项目(K2005-02)

摘　　要：对离子束混合技术在不锈钢基体上沉积的钼膜进行了H+辐照前后的XPS分析,研究了H+辐照对钼膜的结合能的影响。分析结果表明,沉积的钼膜中除了单质钼外,还有部分钼的氧化物;H+辐照结果表明,H+的辐照使钼的结合能向低能方向偏移;钼的氧化物有所减少,说明污染的氧化物在一定程度上被择优溅射掉。Mo films on stainless steel prepared by ion beam mixing were irradiated by hydrogen ion beam with an energy of 10keV and a dose of 1 × 10^18 ions/cm^2. The X-ray photoelectron spectroscopy （XPS） was used for characterization of chemical bonding states of Mo and 0 elements in Mo films before and after hydrogen ion irradiation in order to study the effect of hydrogen ion irradiation on Mo films. The experiment results show that the binding energy of one part of molybdenum component shifted to the lower side due to H^＋ ion irradiation. It is found that the content of the molybdenum oxides in the film was reduced by preferential oxygen sputtering after H^＋ ion irradiation.

关 键 词：离子束混合 MO薄膜 H^+辐照 XPS分析 

分 类 号：O484.5[理学—固体物理]