Al含量对真空电弧沉积ZrAlN薄膜性能的影响  

Correlation between the Properties of Electric-Arc Ion-Plated ZrAIN Film on High-Speed Steel and Single Crystal Silicon Substrates and Al Content

作　　者：秦聪祥[1] 胡社军[2] 汝强[2] 

机构地区：[1]山东理工大学机械工程学院,山东淄博255049 [2]华南师范大学物理与电信工程学院,广东广州510631

出　　处：《材料保护》2007年第3期1-3,23,共4页Materials Protection

基　　金：国家自然科学基金资助项目(50271019)

摘　　要：利用等离子体辅助电弧沉积技术在高速钢片和单晶硅片P(100)上沉积ZrAlN多元薄膜,利用扫描电镜、能谱分析、X射线衍射对薄膜进行了结构和形貌表征,利用显微硬度计、摩擦磨损试验仪对薄膜的性能进行了检测,并研究了铝含量对薄膜组织结构、形貌、显微硬度及耐磨性能等的影响。结果表明:ZrAlN多元薄膜有(111)面的择优取向,随Al含量的增加,(111)衍射峰的位置向小角度偏移,当Al原子分数大于3%时,薄膜中出现AlN相;随着Al含量的增加,薄膜的硬度和耐磨损性能先增加后降低,在Al原子分数为3%时,获最高硬度1570HV0.5N和最小磨痕宽度93μm,这是薄膜中Al含量不同引起晶体结构变化造成的。ZrAIN multielement film was deposited on the surfaces of high-speed steel and single crystal silicon [P(100)] substrates using plasma assisted electric-arc ion-plating technique.The morphology of the film was observed using a scanning electron microscope.The elemental composition and phase structure of the film were analyzed using energy dispersive spectroscopy and X-ray diffraction.Moreover,the microhardness of the ZrAIN film was measured using a microhardness meter,while its wear resistance was evaluated using a friction and wear tester.It was found that the multi-element ZrAIN film had preferential orientation along the(111)plane,and the(111)diffraction peak shifted towards to small angle side with increasing Al content.When the Al content in the ZrAIN film(atomic fraction,the same through the article)was above 3 %,A1N phase was detected.Moreover,the microhardness and wear resistance of the ZrAIN film increased first but followed by decreasing with increasing Al content.The ZrAIN film containing 3 % Al had the highest microhardness of 1 570 HV0.5N and the smallest wear scar width of 93 μm.This was because Al had an obvious effect on the microstructure of the ZrAIN film,i.e.,the microstructure of the ZrAIN film varied with the variation of the Al content.

关 键 词：ZrAlN涂层 离子束辅助沉积 电弧离子镀 高速钢片 单晶硅片 性能 

分 类 号：TG174.444[金属学及工艺—金属表面处理]