MoS_2/WS_2共溅射复合薄膜的微结构及其摩擦磨损性能研究  

Microstructure and Tribological Properties of Co-sputtered MoS_2/WS_2 Composite Films

作　　者：尹桂林[1] 黄平华[1] 余震[1] 何丹农[1] 涂江平[2] 

机构地区：[1]上海交通大学材料科学与工程学院,上海200030 [2]浙江大学材料科学与工程系,浙江杭州310027

出　　处：《摩擦学学报》2007年第1期41-44,共4页Tribology

基　　金：国家"973"计划资助项目(2003CB716200);国家自然科学基金资助项目(50675131)

摘　　要：采用磁控溅射共溅射法制备MoS2／WS2复合润滑薄膜，利用X射线衍射仪、X射线能谱仪及透射电子显微镜对薄膜的成分和结构进行分析，采用UMT-2MT型微摩擦磨损试验机在大气（相对湿度45％～50％）和室温（20～25℃）环境下评价薄膜的摩擦磨损性能．结果表明，MoS2／WS2复合薄膜结构致密，具有较好抗氧化性，其耐磨寿命、摩擦稳定性和抗载荷能力比MoS2磁控溅射薄膜均有显著提高，而摩擦系数更低．MoS2/WS2 composite lubricating film was prepared by magnetron co-sputtering method. X-ray diffraction, energy dispersive X-ray detector and transmission electron microscopy were used to analyze the composition and microstructure of the films. The friction and wear behavior was performed on a reciprocating pin-on-disk tribometer at room temperature in air （RH = 45% - 50% ）. The composite film had a compact microstructure and therefore it improved oxidation resistance. As compared with pure MoS2 film, the MoS2/WS2 composite film exhibited improved friction stability, wear durability and load-carrying capacity, and the composite film also revealed much lower friction coefficient.

关 键 词：MOS2 WS2 磁控溅射 摩擦磨损性能 

分 类 号：TQ174[化学工程—陶瓷工业] TH117.3[化学工程—硅酸盐工业]