Ag溅射参数对FePt/Ag薄膜取向生长的影响  

Effects of Sputtering Factors on Ag on the FePt/Ag Thin Films Tropism Growing

作　　者：范九萍[1] 

机构地区：[1]山西师范大学化学与材料科学学院,山西临汾041004

出　　处：《山西师范大学学报（自然科学版）》2007年第1期77-79,共3页Journal of Shanxi Normal University(Natural Science Edition)

摘　　要：采用有交互作用的正交实验方法对磁控溅射法在玻璃基片上制备FePt/Ag纳米双层膜Ag底层的溅射参数进行研究.通过直观分析,方差分析和XRD图分析,可以选出Ag底层诱导FePt层取向生长的最佳溅射条件,为FePt磁性层性能的进一步研究应用奠定了基础.The sputtering factor of Ag underlayer with FePt/Ag douberlayer were deposited on the glass substrate by magnetron sputtering was researched through orthogonal experiment design with interaction effect. We can pick up the best factor of Ag which effect FePt tropism by intuitionist analysis, square variance analysis and XRD it is prepared for the further study and application of FePt magnetism layer＇s performance.

关 键 词：FePt/Ag双层膜 溅射参数 正交实验 

分 类 号：O614[理学—无机化学]