物理气相沉积减摩与耐磨薄膜  

Physical Vapour Deposited Films for Lubrication and Wear Resistance

作　　者：于德洋[1] 翁立军[1] 

机构地区：[1]中国科学院兰州化学物理研究所固体润滑开放研究实验室

出　　处：《摩擦学学报》1996年第3期282-288,共7页Tribology

基　　金：国家自然科学基金

摘　　要：在摩擦学研究的基础上，综合评述与探讨了物理气相沉积薄膜摩擦和磨损的机械－化学作用机理；根据这种机理分析讨论了对物理气相沉积润滑和耐磨薄膜的基本要求；A mechanical chemical mechanism of friction and wear was primarily studied based on the fundamental results from tribology research;Some essential requirements for physical vapour deposited(PVD) lubricating and wear resistant thin solid films were discussed depending on this mechanism; Basic technology for PVD to reach these requirements was discussed.

关 键 词：物理气相沉积 薄膜润滑 耐磨薄膜 

分 类 号：TB43[一般工业技术] TH117.1[机械工程—机械设计及理论]