New approach to fabricate nanoporous gold film  

作　　者：Hui Zhou Lan Jin Wei Xu 

机构地区：[1]Department of Materials Science, Fudan University, Shanghai 200433, China

出　　处：《Chinese Chemical Letters》2007年第3期365-368,共4页中国化学快报（英文版）

基　　金：This work was supported by the National Natural Science Foundation of China(No.60171008);Shanghai Science and Technology Committee(No.0214nm005,No.0452nm087).

摘　　要：A simple preparation of ultrathin nanoporous gold film was described. Copper and gold were used to fabricate Cu-Au alloy films through vacuum deposition. The formation of nanoporous gold films from the alloy films involved thermal process and chemical etch by hydrochloric acid or by nitric acid. The free-standing nanoporous gold films have been analyzed by scanning electron microscopy （SEM）, transmission electron microscopy （TEM）, X-ray photoelectron spectrometer （XPS） and surface-enhanced Raman scattering （SELLS）. R was noted that the nanoporous gold film etched by hydrochloric acid is uniform with a cover of fog-like moieties.A simple preparation of ultrathin nanoporous gold film was described. Copper and gold were used to fabricate Cu-Au alloy films through vacuum deposition. The formation of nanoporous gold films from the alloy films involved thermal process and chemical etch by hydrochloric acid or by nitric acid. The free-standing nanoporous gold films have been analyzed by scanning electron microscopy （SEM）, transmission electron microscopy （TEM）, X-ray photoelectron spectrometer （XPS） and surface-enhanced Raman scattering （SELLS）. R was noted that the nanoporous gold film etched by hydrochloric acid is uniform with a cover of fog-like moieties.

关 键 词：NANOPORE Gold film Cu-Au alloy Fog-like metal Chemical etch 

分 类 号：TB383[一般工业技术—材料科学与工程]