常见磁控溅射靶材利用率及其计算方法的探讨  

Investigation of utilization ratio and calculating method of familiar magnetron sputtering targets

作　　者：赵嘉学[1] 金凡亚[1] 

机构地区：[1]核工业西南物理研究院,成都610041

出　　处：《核聚变与等离子体物理》2007年第1期66-72,共7页Nuclear Fusion and Plasma Physics

摘　　要：探讨了矩形平面、圆形平面和圆柱管这三种常见磁控溅射源的靶材极限利用率的理论计算方法,推出了利用率的近似计算公式,分析了影响利用率的因素。跑道刻蚀形状(宽度和收缩系数)强烈影响平面类静态靶的极限利用率。旋转磁场圆柱管靶材的极限利用率主要决定于靶的自身几何尺寸(壁厚、长度和管径),与跑道的刻蚀形状(即外界的物理因素)几乎没有关系。Theoretical calculation methods of utilization ratio of three familiar magnetron-sputtering targets are investigated. Approximate computation formula is deduced. Factors influencing utilization ratios are analyzed. Safe surplus thickness affects the utilization ratio of all the three type targets. A term of shrinkage coefficient is introduced in the two former formulas. According to the calculated results from the measured data and theoretical formulas, an approximate conclusion can be made： generally, utilization ratio of a circular planar target is lower than 10%, one of a rectangular planar target is about 20%-30%, both strongly affected by shrinkage coefficient, and one of a rotary cylindrical target can reach 50%, hardly over 70%.

关 键 词：极限利用率 安全剩余厚度 收缩系数 

分 类 号：TB79[一般工业技术—真空技术]