灰度掩模等级的精确控制研究  

Research on Accurately Controlling Gray Levels of Gray-scale Masks

作　　者：颜树华[1] 

机构地区：[1]国防科技大学机电工程与自动化学院,湖南长沙410073

出　　处：《光电子．激光》2007年第1期13-15,共3页Journal of Optoelectronics·Laser

基　　金：国家自然科学基金资助项目(50275145)

摘　　要：在基于空间光调制器(SLM)的灰度掩模并行制作方法中,基于曝光曲线的线性近似关系,建立了灰度掩模强度透过率的线性近似模型,给出了灰度掩模等级精度的精确控制策略。利用卤化银全息感光材料进行了相关实验,制作了菲涅耳透镜的2阶、8阶和16阶灰度掩模。分析了灰度掩模的边缘模糊效应误差,提出了克服非线性效应对灰度等级精度影响的初步方法。Based on a spatial light modulator（SLM） and the approximately linear relationship of exposure curves the approximately linear model of optical transmission coefficients of gray-scale masks has been established ,and the accurately controlling strategies for precision of gray levels were given. The corresponding experiments were accomplished by using sliver halide holographic recording material,and two-levels,eight-levels and sixteen-levels masks of Fresnel lens were manufactured. The error caused by blurred effect at the edge of gray-scale masks was analyzed,and the basic way to overcome the influence on precision of gray levels owing to nonlinear effect was proposed. The accurately controlling model for predsion of gray levels,which has been established in this paper,has an important guiding significance to ensure parallel manufacturing precision of gray-scale masks.

关 键 词：信息光学 二元光学 灰度掩模 精确控制模型 

分 类 号：TN305.7[电子电信—物理电子学]