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作 者:王丽丽[1] 支文[2] 赵利军[3] 王欣[1] 马楠[1] 金丹红[1] 郑伟涛[1]
机构地区:[1]吉林大学材料科学与工程学院,长春130012 [2]长春大学理学院,长春130022 [3]长春大学特殊教育学院,长春130022
出 处:《吉林大学学报(理学版)》2007年第2期275-278,共4页Journal of Jilin University:Science Edition
基 金:国家自然科学基金(批准号:50525204)
摘 要:采用直流磁控溅射方法,以Ar/N2为放电气体(N2/(Ar+N2)=10%),在玻璃和NaCl(100)单晶片上分别沉积获得Fe-N薄膜样品.利用X射线衍射(XRD)、原子力显微镜(AFM)和超导量子干涉仪(SQUID)对样品的结构、形貌和磁性能进行分析,研究基片和基片温度等条件对薄膜的影响.结果表明,以NaCl单晶为基片获得单相γ′-Fe4N薄膜,与玻璃基片相比可降低其生成的基片温度并可扩大形成温度的范围,且比饱和磁化强度略有增大.The Fe-N thin films were deposited on single crystal NaCl (100) and glass substrates via DC magnetron sputtering with an Ar/N= gas mixture (N=/( Ar + N= ) = 10% ) as the discharging gas. The structure, morphology and magnetic properties of the films were characterized by means of X-ray diffraction (XRD) , Atomic force microscope (AFM) and superconducting quantum interference device (SQUID). The effects of substrate and substrate temperature on the structures and magnetic properties of the thin films were investigated. It was shown that the substrate temperature of single phase γ′-Fe4N deposited on NaCl (100) substrate was lower than that on glass substrate. The formation temperature scope and magnetization of single phase γ′-Fe, N on NaCl (100) substrate are all increased.
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