ZrN/W_2N纳米多层膜的调制比对其性能的影响  

Modulation Ratio and Properties of ZrN/W_2N Nano-Multilayers

作　　者：杨瑾[1] 王明霞[1] 李德军[1] 

机构地区：[1]天津师范大学物理与电子信息学院,天津300074

出　　处：《真空科学与技术学报》2007年第2期101-104,共4页Chinese Journal of Vacuum Science and Technology

基　　金：国家自然科学基金(No.50472026);天津市应用基础研究重点项目(No.043801011)

摘　　要：利用射频磁控溅射系统制备了调制周期为30 nm的具有不同调制比例的ZrN/W2N纳米多层膜。研究表明:ZrN/W2N纳米多层膜的界面清晰,通过把ZrN周期性地插入到W2N层,多层薄膜的整体应力得到缓解。在调制比tZrN∶tW2N=2∶3时,纳米多层膜的应力值最小。多层膜的硬度和弹性模量基本高于ZrN和W2N单层材料的平均值,随着调制比的减小,它们的值均有上升趋势,并在tZrN∶tW2N=2∶3时分别达到最高值34 GPa和424 GPa,同时多层膜的膜基结合强度也达到最佳效果,其临界载荷超过了100 mN。多层膜的机械性能改善明显与其调制层结构和多晶结构有着直接的联系。ZrN/W2N nano-multilayers with different thicknesses and a fixed bi-layer period of 30 nm were grown by maganetron sputtering. The interfacial microstructures and mechanical properties were characterized with X-ray diffraction （XRD） and scanning electron microscopy（SEM）. The results show that the modulation ratio significandy affects the mechanical property of the multilayer. For example, insertion of ZrN layer minimizes the stress in W2N layer. As the thickness ratio of ZrN and W2N lowers to 2：3, the hardness and elastic modulus increases up to 34 GPa and 424 GPa, respectively. Besides, the interfacial adhesion between the multilayers and the substmte maximizes,with a critical load higher than 100 mN. The interfaces were found to be sharp and well defined. Possible mechanism was also tentatively explained.

关 键 词：磁控溅射 ZrN/W2N纳米多层膜 调制比 硬度 

分 类 号：TG174.444[金属学及工艺—金属表面处理] TG174.4[金属学及工艺—金属学]