工作气压对TaN/VN纳米多层膜结构与机械性能的影响  

Effect of working pressure on microstructure and mechanical properties of TaN/VN bilayer nanofilms

作　　者：张学华[1] 曹猛[1] 乔林[1] 杨瑾[1] 刘桐[1] 李德军[1] 

机构地区：[1]天津师范大学物理与电子信息学院,天津300074

出　　处：《真空》2007年第2期40-43,共4页Vacuum

基　　金：天津市应用基础研究重点项目(043801011);国家自然科学基金(50472026)

摘　　要：本研究选择钽和钒的氮化物作为个体层材料,利用超高真空射频磁控溅射系统制备TaN、VN及一系列的TaN/VN多层薄膜。通过XRD,纳米力学测试系统分析了该体系合成中工作气压对多层膜结构与机械性能的影响。结果表明多层膜的纳米硬度值都高于两种个体材料混合相的硬度值;当工作气压为0.2Pa时,结晶出现多元化,多层膜体系的硬度、弹性模量、应力均达到最佳效果,最大硬度达到31GPa。多层膜的机械性能改善明显与工作气压的变化有直接的联系。证明了通过选择合适的工作气压条件,合成具有高硬度的纳米多层膜是可以实现的。TaN/VN bilayer nanofilms were prepared in FJL560Cl2 ultra-high vacuum RF magnetron sputtering chamber. XRD, nano-indenter and profilometer were employed to investigate the effect of working pressure on the microstructure and mechanical properties of the films. The results showed that the nanohardness of the bilayer film is higher fhan that of the mixture of the two monolithic TaN and VN films. When the working pressure is 0.2 Pa, the hardness of TaN/VN bilayer film reaches the highest value up to 31 GPa with elastic modulus/stress optimized. It was found that the improvement of the mechanical properties of the bilayer films relates directly to the change in working pressure, thus verifying that choosing appropriate conditions for the working pressure is available to prepare high-hardness nanofilms.

关 键 词：射频磁控溅射 TaN/VN多层膜 工作气压 

分 类 号：TG174.4[金属学及工艺—金属表面处理]