磁控溅射WO_x-Ti(Mo,Ni,V)薄膜的电致变色性能  

The Electrochromic Properties of WO_x Film Doped with Ti (Mo,Ni,V) by Magnetron Sputtering

作　　者：黄佳木[1] 徐爱娇[1] 蔡明[1] 

机构地区：[1]重庆大学材料科学与工程学院,重庆400045

出　　处：《材料导报》2007年第4期144-146,154,共4页Materials Reports

基　　金：重庆市科委攻关项目(2000-6214)

摘　　要：采用反应磁控溅射工艺分别制备掺杂Ti、Mo、Ni、V的WOx薄膜,研究了掺杂对其电致变色性能的影响机理。实验结果表明,适量的掺杂可以提高薄膜的电致变色性能,Mo的掺杂可以调节光谱吸收范围,Ni、V的掺杂可以提高记忆存储能力,Ti的掺杂可以延长循环寿命;磁控溅射制备的掺杂WOx薄膜均为非晶态。WOx films doped with Ti （Mo, Ni, V） are deposited on ITO glass substrates by reactive magnetron sputtering. Their electrochromic properties and influence mechanism are studied. Experiment results demonstrate that in a certain doping range , WOx films doped with Ti （Mo, Ni, V） would improve the electrochromic performances. The spectrum could be widened by Mo-doping. The ability of color storage could be improved by Ni or V doping and the cyclic life span could be longer by Ti doping. WOx films after doping are still in amorphous state.

关 键 词：WOx 薄膜 电致变色 掺杂 磁控溅射 

分 类 号：TB34[一般工业技术—材料科学与工程] O484[理学—固体物理]