退火温度对ZnO薄膜结构及光学性能影响  

Influences of Annealing Temperature on the Structure and Optics of ZnO Films

作　　者：李珍[1,2,3] 陈文[1] 李飞[3] 艾常涛[3] 靳福江[3] 

机构地区：[1]武汉理工大学材料科学与工程学院,武汉430070 [2]湖北大学铁电压电材料与器件湖北省重点实验室,武汉430062 [3]中国地质大学材料科学与化学工程学院,武汉430074

出　　处：《武汉理工大学学报》2007年第E01期110-113,共4页Journal of Wuhan University of Technology

基　　金：湖北省重点实验室基金.

摘　　要：以二水醋酸锌为原料，使用溶胶凝胶法在玻璃基体上旋涂氧化锌薄膜。用X射线衍射、室温光致发光、可见分光光度计等方法对薄膜的结构、光学特性进行了研究，同时结合AFM和分光光度计，讨论了不同退火温度对氧化锌薄膜结构，透光率的影响。结果表明：随着退火温度的升高，ZnO薄膜衍射峰增强，其中在500℃时，（002）峰最强，即沿C轴的取向性最好，晶粒尺寸依次增大，其中500-550℃时，晶粒尺寸比较小且分布均匀，平均粒径40nm，表面粗糙度最小，小于8nm；退火温度为550℃时，ZnO薄膜的透光率最高，达96％以上。并在380nm附近有很强的紫外发射峰。Zinc oxide thin film was fabricated on the glass substrate by sol-gel methods and zinc acetate dihydrate was used as a starting material. X-ray diffraction （XRD）, photol , and visble spectral photometer had been used to characterize structure and optical property of ZnO thin film. And discussed effection of structure and luminousness of thin film under different annealing temperature. The result indicated, with annealing temperature increasing, the intensity of ZnO thin film diffraction peak. get strengthened. Thereinto, At 500 12, the intensity of （002） is the highest, grew best along C axis, size of crystal grain augmented in turn. At 500--550 12, size of crystal grain were relatively small and uniform distribution, 40 nm in diameter averagely, and is the least, less than 8 nm; At 550 12, luminousness of ZnO thin film is tiptop, more than 96%. And ultraviolet strong emission peak at round 380 nm was appeared.

关 键 词：ZNO薄膜 退火温度 粗糙度 透光率 

分 类 号：O482.31[理学—固体物理]