Si基光子晶体的制备与器件应用  

Fabrication of Si-Based Photonic Crystals and Its Device Applications

作　　者：尚勇[1] 彭英才[2] 

机构地区：[1]河北大学物理科学与技术学院,河北保定071002 [2]河北大学电子信息工程学院,河北保定071002

出　　处：《微纳电子技术》2007年第5期235-240,253,共7页Micronanoelectronic Technology

摘　　要：光子晶体是近十年来迅速发展起来的一种新型人工结构的功能材料。本文简要介绍了Si基光子晶体的主要特点;着重介绍了Si基光子晶体的几种主要制备方法,如精细干式蚀刻法、胶质晶体模板法、宏观多孔Si的电化学腐蚀、多光子聚合法和核壳结构纳米晶粒镶嵌法等;概要介绍了Si基光子晶体在Si基发光器件和Si基光波导器件中的应用。对目前存在的问题进行了讨论,并展望了它的未来发展趋势。Photonic crystal is a new functional materrial developed in recent 10 years. Their main features are introduced. We emphaticaly introduce some processes of Si-based photonic crystals,which are fine dry etching, silica sphere temptate, photoelectrochemical etching of macroporous silicon, photonic polymerization and silicon nanoclusters embedded at the Si core, etc. The applications of Si-based photonic crystals in the Si-based light-emitting devices and waveguide devices are also described. Some existing problems are discussed, and future development trends are viewed.

关 键 词：Si基光子晶体 制备方法 Si基光子器件 Si基光子集成 

分 类 号：O782[理学—晶体学]