条形射频源大口径离子束刻蚀机性能(英文)  

Characteristics of a large-scale ion beam etcher based on radio frequency linear source

作　　者：董晓浩[1] 刘颖[1] 赵飞云[1] 徐德权[1] 徐向东[1] 周银贵[1] 汪啸[1] 姚传荣[1] 洪义麟[1] 付绍军[1] 徐朝银[1] 

机构地区：[1]中国科学技术大学国家同步辐射实验室,安徽合肥230029

出　　处：《中国科学技术大学学报》2007年第4期530-535,共6页JUSTC

基　　金：National High Technology Research and Development Program of China("863"Program)(2005AA849020)

摘　　要：针对大尺寸基底往复扫描条形离子束来实现大面积刻蚀的特点,实验测试了基于射频感应耦合等离子体离子源大型离子束刻蚀机的性能.利用法拉第筒扫描探测系统在线测量束流密度,通过控制气体流量、调节加速电压等,得到了纵向束流密度±5.3%均匀性的较好结果.刻蚀实验表明40 cm长度范围刻蚀深度均匀性为±5.4%,同时具有较好的束流稳定性.添加束阑,并结合掩模修正束流,会得到更好的束流密度与刻蚀深度均匀性.The characteristics of a large scale ion beam etcher with a radio frequency linear source were described. With a 6 cm×66 cm rectangular beam which the substrate carriage traverses back and forth, an area as large as 40 cm×40 cm can be covered. According to the illustration of the operating principle, construction features of the etcher, commissioning results and technical performance were presented. Measurements with a scanning Faraday-cup based on current probe were used to optimize the ion beam spatial uniformity. A ±5.3% uniformity of current density along the major axis of the ion source was achieved. Etching experiments show a good uniformity of ±5. 4% of etching depth over the 40 cm. The uniformity can be improved combined with beam revising by beam diaphragm and correction mask. Through the measurement of beam current stability, performance of the system was also taken into account.

关 键 词：离子束刻蚀机 条形射频离子源 束流密度均匀性 束阑 大口径衍射光学元件 

分 类 号：TN405.982[电子电信—微电子学与固体电子学] O436.1[机械工程—光学工程]