辅以动态氮离子轰击的氩离子束溅射沉积PTFE高分子膜  

PTFE film prepared by Ar + sputtering deposition with simultaneous N + bombardment

作　　者：李有宏[1] 龙振湖[1] 宫泽祥[1] 任春生[1] 

机构地区：[1]大连理工大学三束材料改性国家重点实验室

出　　处：《大连理工大学学报》1997年第2期208-211,共4页Journal of Dalian University of Technology

基　　金：核工业总公司"八五"科技攻关项目

摘　　要：用辅以动态氮离子轰击的氩离子束溅射沉积方法，在３０４不锈钢基材上沉积聚四氟乙烯薄膜．经ＸＰＳ和ＩＲＳ分析，确定了聚四氟乙烯膜的存在并进行了结构分析．划痕试验表明：这种方法制成的聚四氟乙烯膜与基材之间有较好的结合力．Polytetrafluoroethylene(PTFE) film on 304 stainless steel was formed by using Ar + sputtering deposition with N + bombarding the substrate surface simultaneously. XPS and IRS analyses confirmed that PTFE film was formed on the surface of 304 stainless steel substrate. The structure of the film thus formed is interpreted according to the XPS and IRS spectra analyses. Scratch test shows that the film has better adhesion with the substrate than that produced without N + bombardment.

关 键 词：薄膜 聚四氟乙烯 离子束溅射沉积 离子束轰击 

分 类 号：TG174.464[金属学及工艺—金属表面处理]