用于CTCP技术的射频无电极放电氮气等离子体光源研究  

A Nitrogen Plasma Light Source Stimulated by RF Electrodeless Field Discharge for CTCP Technology in Printing

作　　者：李朝阳[1] 陈强[1] 张广秋[1] 

机构地区：[1]北京印刷学院等离子体物理与材料研究室,北京102600

出　　处：《影像技术》2007年第3期47-50,共4页Image Technology

基　　金：北京印刷学院青年基金(600004);北京市重点学科建设项目(E-b-05-74);北京印刷学院人材引进基金(0600024)支持

摘　　要：本文报道了一种利用射频无极放电激励的氮气等离子体新型光源,成功地对“星光”PS版进行了曝光,光谱分析表明氮气射频放电光源的光谱结构较碘镓灯更适于传统PS版曝光。为此,进一步从射频功率、工作气压等方面探讨了光源的最佳运行参数,得到在230Pa、160W、采用两个传输透镜聚焦后获得的光源功率密度是2.23mW/cm2。最后给出了运用此光源对PS版的曝光结果。It is very important to popularize the computer to plate technology （CPT） using the conventional pre-sensitized plate in our printing and packaging industry. In this paper, a novel nitrogen plasma light source stimulated by RF electrodeless field discharge is reported. By using it ,a commercial PS plate from Chinese Academy of Printing Technology is successfully exposed. The spectrum analysis shows the lamp we developed is more suitable for PS plate exposure than very popularly used iodine gallium lamp. And further, the optimum parameters of our light source were explored from the RF power and working pressure. Under the conditions of incident power 160W, working pressure 230Pa with two focalized lens, an optical power density of 2.23mW/cm^2 is obtained. At last, the exposure result of PS plate with our UV light source is represented..

关 键 词：计算机直接制版技术 射频无电极放电 等离子体光源 

分 类 号：TS804[轻工技术与工程]