纳米级工艺制程仿真SenTaurus Process的应用  

Application of Nano-Level Integrated Process Simulation Tool SenTaurus Process

作　　者：于英霞[1] 李惠军[1] 侯志刚[1] 张宪敏[1] 

机构地区：[1]山东大学孟尧微电子研发中心,济南250100

出　　处：《微纳电子技术》2007年第6期295-298,311,共5页Micronanoelectronic Technology

摘　　要：基于Synopsys Inc.最新推出的新一代nm级IC制程工艺设计工具--SenTaurus Process,实现了CMOS架构的nm级NMOS制程的工艺级可制造性设计。仿真结果体现了SenTaurus Process的强大功能和使用SenTaurus Process进行工艺级可制造性设计的必要性。Based on the elementary functions of the new generation nano-level IC process design tool： SenTaurus Process issued recently by Synopsys Inc, nano-level NMOS process level DFM based on CMOS framework was realized. Simulated results reveal the powerful functions of Sen- Taurus Process and the necessity of technology-level design for manufacturing using SenTaurus Process.

关 键 词：集成电路 纳米层次 工艺仿真 可制造性设计 

分 类 号：TN405[电子电信—微电子学与固体电子学] TN402