沉积气压对电弧离子镀制备ZnO薄膜的结构和性能影响  

The influences of deposition pressure on ZnO thin films prepared by cathodic vacuum arc deposition

作　　者：王明东[1] 朱道云[1] 郑昌喜[1] 何振辉[1] 陈弟虎[1] 闻立时[1] 

机构地区：[1]中山大学光电材料与技术国家重点实验室物理科学与工程技术学院,广东广州510275

出　　处：《功能材料》2007年第6期1013-1015,共3页Journal of Functional Materials

基　　金：国家高技术研究发展计划(863计划)资助项目(2003AA311122)

摘　　要：采用阴极真空电弧离子镀技术在玻璃衬底上制备出了具有择优取向的透明ZnO薄膜。利用X射线衍射仪、扫描电子显微镜及紫外一可见吸收光谱仪分别对ZnO薄膜的结构、表面形貌及可见光透过率进行了分析。XRD结果表明，所制备的ZnO薄膜具有六角纤锌矿结构的（002）和（101）两种取向，在沉积气压〉1．0Pa时所制备的ZnO薄膜具有（002）择优取向，并且非常稳定。SEM图表明，ZnO晶粒大小较为均匀，晶粒尺寸随着气压升高而变小。在400～1000nm范围内，ZnO薄膜的可见光透过率超过80％，吸收边在370nm附近，所对应的光学带隙约为3．33～3．40eV，并随着沉积气压上升而变大。By using cathodic vacuum arc ion deposition, uniform and compacted ZnO thin films with preferred orientation and high optical transparence were prepared on the slide-glasses substrates. XRD patterns indicate that the ZnO thin films have combined orientation of ZnO （002） and ZnO （101）. The preferred orientation of ZnO （002） were obtained at an optimum deposition pressure （〉1.0Pa）. The grain size of ZnO decreases with the deposition pressure increasing. The transparences of ZnO thin films are higher than 80 % in the visible light range. The absorption edges are determined to be around 370nm, the corresponding optical band gaps increasing with the deposition pressure increasing, are about 3.33 to 3.40eV.

关 键 词：真空电弧离子镀 X射线衍射 ZNO薄膜 

分 类 号：TB43[一般工业技术]