掺Cu的SrBi_2Ta_2O_9薄膜的非线性光学特性的研究  

Properties of the optical nonlinearity in Cu:SrBi_2Ta_2O_9 thin films

作　　者：徐利[1] 顾豪爽[1] 王忠太[1] 陈侃松[1] 

机构地区：[1]湖北大学铁电压电材料与器件湖北省重点实验室,湖北武汉430062

出　　处：《湖北大学学报（自然科学版）》2007年第2期147-149,共3页Journal of Hubei University：Natural Science

基　　金：国家自然科学基金资助项目(50272020);教育部科学技术研究重点项目(03084);湖北省创新研究群体科学基金

摘　　要：以SrBi2Ta2O9陶瓷和高纯Cu片作为靶材,利用射频磁控溅射方法在双面抛光的石英基片上制备了掺Cu金属颗粒的SrBi2Ta2O9复合薄膜.用XRD和AFM表征了薄膜的结晶性能和表面形貌;利用单光束Z扫描技术在波长532 nm处测量了薄膜的非线性光学特性,其三阶非线性光学极化率的实部Reχ(3)=2.26×10-9esu,虚部Imχ(3)=0.62×10-9esu.Cu-doped SrBi2Ta2O9 thin films were grown on SiO2 substrates by RF magnetron sputtering method using a SrBi2Ta2O9 target and Cu plates. The structural properties of the samples were characterized by X-ray diffraction and atomic force microscopy. The nonlinear optical properties of the films were determined by a single beam Z-scan at a wavelength of 532 nm. The results show that Cu：SrBi2Ta2O9 thin films exhibit a great nonlinear optical response with the real and imaginary parts of the third-order nonlinear optical susceptibility Z^（3） being 2.26 × 10^-9esu and 0. 62 × 10^-9esu, respectively.

关 键 词：Cu∶SrBi2Ta2O9 薄膜 磁控溅射 Z-SCAN 光学非线性 

分 类 号：O484.41[理学—固体物理]