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作 者:熊惠芳[1] 唐新桂[1] 易双萍[1] 范仰才[1] 蒋力立[2] 陈王丽华[3]
机构地区:[1]广东工业大学物理与光电工程学院,广州510090 [2]广东工业大学试验中心,广州510090 [3]香港理工大学应用物理系
出 处:《功能材料与器件学报》2007年第3期266-270,共5页Journal of Functional Materials and Devices
基 金:广东省自然科学基金自资课题(No.05001825)
摘 要:在Pt(111)/Ti/SiO2/Si(100)衬底上,用脉冲激光沉积工艺分别制备出了(110)外延取向生长的(Ba0.65Sr0.35)TiO3/CaRuO3(BST/CRO)异质结构薄膜;BST/CRO异质结构薄膜由纳米晶团簇组成,最大的团簇晶粒达500 nm,平均晶粒尺寸在60~80 nm,薄膜厚度为650 nm.BST/CRO异质结薄膜均为表面平滑和致密结构.BST/CRO异质结薄膜的介电常数和介电调谐率分别高达851和78.1%.与纯BST薄膜比较,用CRO作电极,增益介电常数与介电调谐率.The highly ( 110 ) - oriented ( Ba0.65 Sr0.35 ) TiO3 ( BST)/CaRuO3 (CRO) heterostructure thin films on Pt/Ti/SiO2/Si substrates were prepared by pulsed laser deposition (PLD). The surface morphology of BST/CRO heterostructure thin film show many grain clusters, with cluster size up to 500 nm, which were composed by nano - sized grains in size of about 60 - 80 nm. It also revealed that a dense, homogenous, uniform microstructure, smooth and pinhole -free surface morphology was obtained in the BST/CRO heterostructure thin films on Pt/Ti/SiO2/Si substrates. The dielectric constant and tunabilities of BST/CRO heterostructure thin films were 851 and 78.1%, respectively. Compared with single composition BST thin films, the CRO bottom electrodes enhanced the dielectric properties and tunabilities.
关 键 词:脉冲激光沉积 钛酸锶钡薄膜 异质结构 介电调谐率
分 类 号:TM28[一般工业技术—材料科学与工程]
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