钽酸锶铋陶瓷靶的烧结及其薄膜微结构分析  

SINTER OF THE STRONTIUM BISMUTH TANTALITE TARGET AND ANALYSIS OF THE THIN FILMS MICROSTRUCTURE

作　　者：周宁生[1,2,3] 李明 金灯仁 陆怀先[1,2,3] 杨平雄 

机构地区：[1]南京大学固体微结构国家重点实验室 [2]中国科学院上海冶金研究所 [3]上海大学嘉定校区

出　　处：《南京大学学报（自然科学版）》1997年第2期205-209,共5页Journal of Nanjing University（Natural Science）

摘　　要：高致密、结晶好的钽酸锶铋陶瓷靶由ＳｒＣＯ３、Ｂｉ２Ｏ３和Ｔａ２Ｏ５粉末混合、预烧、压模和烧结而成，预烧和烧结温度范围分别为９００～１０００℃和１０００～１４００℃。用脉冲准分子激光沉积技术制备得到非晶钽酸锶铋薄膜，在氧气氛下经退火得到多晶钽酸锶铋薄膜。ＸＲＤ分析得到钽酸锶铋薄膜择优取向以（００８）和（１１５）为主；ＴＥＭ分析得到钽酸锶铋薄膜晶界清晰、结构致密，平均晶粒大小约为２０ｎｍ，薄膜的界面清晰、陡峭，厚度约为２００ｎｍ。The high density, well crystallized ceramic strontium bismuth tantalite target was manufactured by reaction sintering of mixing SrCO 3,Bi 2O 3 and Ta 2O 5 powders. The calcination and sinter temperatures were 900￣1 000℃ and 1 000￣1 400℃ respectively. The thin films were fabricated using pulsed laser deposition. The films showed high diffraction peaks of (115) and (008). A dense structure with around 200nm grain size was observed using the plane TEM. The interface between the film and substrate was very abrupt by cross section TEM.

关 键 词：钽酸锶铋 激光沉积 微结构 铁电薄膜 薄膜 烧结 

分 类 号：O484.1[理学—固体物理]