PCB激光投影光刻照明系统的设计  

Design of the Illumination System for Laser Projection Lithography

作　　者：林清华[1] 李文静[1] 宋超[1] 王鲁宾[1] 

机构地区：[1]广东工业大学物理与光电工程学院,广东广州510006

出　　处：《广东工业大学学报》2007年第2期33-35,共3页Journal of Guangdong University of Technology

基　　金：广州市科技计划项目(2006Z3-D0041)

摘　　要：针对大面积、高产量和节约型印制电路板(PCB)生产使用的激光投影光刻机,利用ZEMAX工程光学设计软件,对其照明系统进行了模拟设计与优化,并对优化后的结果进行了分析.对于设计的照明系统,其像面均匀性、光斑大小和形状、像差以及照明系统与投影物镜的匹配都符合实际要求.For the laser projection lithography system used for the production of large-area, high processing throughput, and cost-effective printed circuit boards （PCB）, its illumination system is simulation-designed and optimized using ZEMAX optical design software, and the optimized results are analyzed. The designed results, including uniform of image plane, size and shape of beam geometry, aberration as well as matching of illumination system with projection lens, fulfill the demands of laser illumination system in technical specifications.

关 键 词：印制电路板 激光投影光刻 照明系统 

分 类 号：TN305.7[电子电信—物理电子学]