低温熔盐中Gd-Pr-Co合金膜的电沉积研究  

Electrodeposition of Gd-Pr-Co alloy film in low temperation molten salt

作　　者：刘青[1] 陈必清[1] 王建朝[1] 郭承育[1] 王金贵[1] 

机构地区：[1]青海师范大学化学系,青海西宁810008

出　　处：《西北师范大学学报（自然科学版）》2007年第4期74-78,共5页Journal of Northwest Normal University(Natural Science)

基　　金：国家自然科学基金资助项目(50264004);教育部重点科学技术研究基金资助项目(03136)

摘　　要：应用循环伏安法研究了在353 K的乙酰胺-尿素-NaBr熔体中Co2+在Cu电极上的电化学行为,获知Co(Ⅱ)+2e Co(0)是一步完全不可逆反应,测得传递系数α=0.28,扩散系数D0=4.06×10-7cm2/s.Gd(Ⅲ)、Pr(Ⅲ)不能单独还原为Gd和Pr,但可以被Co(Ⅱ)诱导共沉积.由恒电位电解法得到非晶态的Gd-Pr-Co合金,合金膜中Gd和Pr的含量随电解电位、时间和浓度的变化而变化,合金膜中Gd和Pr的最高质量百分数分别可达到68.18%,29.26%.The cyclic voltammetry method is used to study the behavior of Co^2＋ on Cu electrodes in acetamide-urea-NaBr melt at 353 K. Electroreduction of Co^2＋ to metallic Co is irreversible in one step. The transfer coefficient α=0.28 and diffusion coefficient Do=4.06 × 10^-7 cm^2/s of the Cu eletrode are measured, while Gd （Ⅲ） and Pr （ Ⅲ ） can not be reduced to Gd and Pr directly but can be inductively codeposited with Co^2＋. The amorphous Gd-Pr-Co alloy films are obtained by potentiostatic electrolysis. The content of Gd and Pr in the Gd-Pr-Co deposits changes with the cathode potential, molar ratio of Gd^3＋/Pr^3＋/Co^2＋ and the electrolysis time. The maximum amount of Gd and Pr in alloy film reaches to 68.18% ,29.26% in the experiment.

关 键 词：诱导共沉积 恒电位电解 乙酰胺-尿素-NABR熔体 Gd—Pr-Co合金 

分 类 号：O641.4[理学—物理化学] O657.1[理学—化学]