扫描电镜中的电子反射镜像现象及应用  

Electron Mirror Phenomenon in Scanning Electron Microscopy and Its Application

作　　者：张隐奇[1] 吉元[1] 田彦宝[1] 付景永[1] 徐学东[1] 戴琳[1] 王丽[1] 

机构地区：[1]北京工业大学固体微结构与性能研究所,北京100022

出　　处：《真空科学与技术学报》2007年第4期354-358,共5页Chinese Journal of Vacuum Science and Technology

基　　金：国家自然科学基金项目(No.60171024);北京市教委基金项目(No.KN200610005030)资助

摘　　要：观察非导电样品在扫描电镜(SEM)中产生的电子镜现象。研究了电子镜出现的条件,监测了电子镜像出现过程中表面电势Es和吸收电流Ia的变化。结果表明,当Es达到7 kV-9 kV时出现了电子镜像。当电子总发射产额σ■1,Es■ 4kV,及Ia■0时,形成了稳定而无畸变的电子镜像。利用电子镜现象可确定电子散射率及入射电子能量的临界值E2,以及评价非导电样品导电性能。Electron mirror phenomenon in scanning electron microscopy （SEM）, resulting from non-conducting samples, was observed. Various related information, inclduing mirror image appearance conditions, changes in surface potential Es, and the absorption current Ia during appearance of the electron mirror, was studied. The results show that the electron mirror image shows up at a surface potential up to 7 kV - 9 kV. Aberration-free mirror image is fairly stable under the following conditions： the total electron yield, σ≌1 ; the surface potential Es≌4 kV; and the absorption current Ia≌ 0. Such electron mirror phenomenon can be used to evaluate physical quantities, such as the electron scattering ratio, the critical energy of Es of the primary electron and the sample＇ s electric conductivity.

关 键 词：扫描电镜 电子镜 非导电材料 表面电势 

分 类 号：TN16[电子电信—物理电子学] TB303[一般工业技术—材料科学与工程]