激光化学气相沉积(连载之三)  

Laser Chemical Vapour Deposition(LCVD)(Ⅲ)

作　　者：张魁武[1] 

机构地区：[1]北京机床研究所,北京100102

出　　处：《金属热处理》2007年第8期105-113,共9页Heat Treatment of Metals

摘　　要：本讲座介绍了激光化学气相沉积的基本原理,较详细地讲述了制备金属薄膜、金刚石薄膜、类金刚石薄膜、氢化非晶硅薄膜、化合物半导体薄膜及绝缘体薄膜等所用的激光器、工艺参数以及薄膜的性能。The basic principles of laser chemical vapour deposition were introduced. The applied lasers, technological processes and properties of the deposited metal thin films, diamond thin films, diamond-like thin films, hydrogenated amorphous silicon thin films, compound semiconductor thin films and insulating thin films etc. were described in details.

关 键 词：激光化学气相沉积 激光诱导 激光辅助 光解激光 热解激光 光热共解激光 

分 类 号：TG156.99[金属学及工艺—热处理]