非晶RGM薄膜应力的基片曲率显微测定方法研究  

Study on the Micro-measuring Method of Substrate Curvature for the Amorphous RGM Stress

作　　者：周白杨[1] 林庆彬[1] 邓光华[1] 

机构地区：[1]福州大学材料科学与工程学院,福建福州350002

出　　处：《稀土》2007年第4期38-42,共5页Chinese Rare Earths

基　　金：福建省科技厅高技术与火炬计划基金(99-H-44);福州大学科技发展基金(XKJ(QD)-01/3);福建省高校测试基金资助

摘　　要：利用基片曲率法原理,设计改装了一套基片曲率显微观测装置用于测量稀土超磁致伸缩合金非晶RGMF薄膜试样的曲率半径并计算薄膜应力;分析探讨了使用该装置测量计算曲率半径的随机误差与系统误差,并在此基础上进一步分析了薄膜应力的相对误差。利用该装置测量了采用离子束溅射沉积法在青铜基片上沉积TbDy-Fe非晶薄膜的应力大小为150MPa,为压应力,测量总误差在8%以内。According to the principle of substrate curvature method, an apparatus had been designed and refitted to measure the curvature radius of amorphous RGMF sample,then the thin film stress was calculated. The radom error and system error on the apparatus were analysed and discussed during measure and calculation ,and the relative error of thin film stress was further studied in the process of experiment. The stress of TbDy-Fe thin film coated on bronze substrate by ion beam sputtering was measured by using the apparatus and calculated. The results show that the stress value of TbDy-Fe thin film is 150 MPa which is compressive stress ,and the total measuring error is under 8%.

关 键 词：非晶态 稀土磁伸薄膜 曲率测量 薄膜应力 

分 类 号：O484.5[理学—固体物理] TG139.8[理学—物理]