仿真技术在晶圆制造光刻区派工中的应用  

Application of Simulation Technology in the Dispatching of Photolithography Area in Wafer Fabrication

作　　者：宁凝[1] 钱省三[1] 孟志雷[1] 

机构地区：[1]上海理工大学工业工程研究所/微电子发展中心,上海200093

出　　处：《半导体技术》2007年第9期750-752,共3页Semiconductor Technology

基　　金：上海市重点学科基金(T0502);教育部博士点基金项目(20050252008)

摘　　要：对光刻区的派工法则进行了分析研究。在传统的先来先服务规则的基础上,根据光刻区的生产特性及实际情况,以最小化完工时间为目标,主要考虑到减少设备的调整时间,提出一种启发式综合派工法则。对某晶圆制造厂的一组光刻设备进行实例研究,运用Extend仿真软件对传统先来先服务规则和启发式综合派工法则分别建立仿真模型,通过仿真得出主要生产性能参数。结果表明,启发式综合派工法则明显优于现有的先来先服务规则。The dispatching rules of semiconductor manufacturing were analysed and researched, according to the production characteristics and practical situation of the photolithography area, a heuristics comprehensive dispatching rule was put forward to minimize the making span time based on the existing first come first service rule. In the cases study, the simulation models of the two rules were set up, and the main performance parameters of the system from the Extend simulation results were got. The effects of the dispatching rules were analyzed. The results show that the heuristics comprehensive dispatching rule is better than the traditional first come first service rule.

关 键 词：光刻区 派工法则 系统仿真 晶圆制造 

分 类 号：TP391.9[自动化与计算机技术—计算机应用技术]