用二氧化钛、二氧化硅和氟化镁膜料镀制0.4μm^1.1μm超宽带增透膜  

0.4 μm～1.1 μm AR film prepared with TiO_2,SiO_2 and MgF_2

作　　者：谭宇[1] 梁宏军[2] 刘永强[1] 赵兴梅[1] 

机构地区：[1]西安应用光学研究所,陕西西安710065 [2]西安通信学院数理教研室,陕西西安710106

出　　处：《应用光学》2007年第5期623-626,共4页Journal of Applied Optics

摘　　要：对0.4μm^1.1μm超宽带增透膜的镀制工艺进行了研究。根据长期从事该工作的经验和对膜料性能的研究,结合国产设备的实际情况,在膜料的选取上主要考虑其透明光谱区域、折射率、材料的蒸发方式、机械特性、化学稳定性及抗高能辐射等因素;最终选择用二氧化钛、二氧化硅和氟化镁3种常用膜料镀制0.4μm^1.1μm超宽带增透膜。涉及该膜系的膜层共有8层,结构为:玻璃■H■M■H■M■H■M■H■L■空气■。制作工艺方便简单、稳定,制做的膜层具有较好的光谱和机械性能,满足光电仪器实际使用要求。The coating techniques for preparing 0.4μm-1.1μm wide spectral AR film made up of TiO2, SiO2 and MgF2 are discussed. Some factors such as the spectral transmittance range, refractive index, vaporous mode, mechanical properties, chemical stability and anti radiation were considered in the selection of film-materials. TiO2, SiO2 and MgF2 film-materials were adopted for the preparation of AR film operating at wide spectrum of 0.4μm-1.1μm according to the experience of multilayer design, the understanding of film-material performance and the performance of the domestic equipments. The film structure is GHMHMHMHLA. This technique is convenient and robust. The film has good spectral and mechanical performance, and it meets the operational requirement of electro-optical system.

关 键 词：膜厚 膜层折射率 宽光谱 镀膜材料 

分 类 号：O484.41[理学—固体物理] TN209[理学—物理]