O_2压对脉冲激光沉积ZnO薄膜性能的影响  

Influences of Oxygen Pressure on the Properties for ZnO Films Deposited by Pulsed Laser Deposition

作　　者：滕晓云[1] 刘彩池[1] 郝秋艳[1] 张丽[2] 许贺菊[2] 于威[2] 

机构地区：[1]河北工业大学材料学院,天津300130 [2]河北大学物理科学与技术学院,河北保定071002

出　　处：《光电子．激光》2007年第9期1058-1060,共3页Journal of Optoelectronics·Laser

基　　金：河北省自然科学基金资助项目(E2006001006);教育部新世纪优秀人才支持计划;河北省自然科学基金资助项目(E2005000042)

摘　　要：采用脉冲激光沉积(PLD)法在Al2O3(0002)衬底上制备了具有高c轴择优取向的ZnO薄膜。用X射线衍射(XRD)、原子力显微镜(AFM)、霍尔电导测量和透射光谱等表征技术研究了工作O2压对ZnO薄膜的结晶特性、电学和光学性能的影响。研究结果显示:在133×10-1～266×10-2Pa内,ZnO薄膜的晶粒尺度随工作O2压的增加而增加,晶体结构趋于完整,表面更加平整;当工作O2压为266×10-1Pa时,ZnO薄膜的表面粗糙度有所增加,薄膜的结晶质量恶化;工作O压的不同导致ZnO薄膜的电学、光学特性的变化。ZnO thin films with strong caxis preferred orientation were grown on Al2O3 （0002） substrates by pulsed laser deposition（PLD） technique. The influence of oxygen pressure ranging from 266× 10^-2 Pa to 133× 10^-1 Pa on the micro structure,optical and electrical properties of ZnO films was investigated by X-ray diffraction（XRD） ,atomic force microscopy （AFM） ,transmittance spectrometry and Hall effect measurement. The results show that with the increase of oxygen pres sure up to 266×10^2 Pa,the grain size increases,the crystallinity is enhanced and the film becomes smooth. When the oxy gen pressure is 133 ×10^-1 Pa, the roughness ot＂ the surfaces increases and the quality of the fihns deteriorates. In addition, the difference of oxygen pressure results in the variation of the electrical and optical properties of the fihns.

关 键 词：ZNO薄膜 O2压 脉冲激光沉积(PLD) 

分 类 号：O484.4[理学—固体物理]